Excellent pulse control for semi-oxidized targets
Consulting: +49 (0) 6151 86072-41 or sales@adl-gmbh.com
ADL unipolar pulse systems are the best choice for the sputtering of partly oxidic processes. Either partly reactive with metallic targets or sub-stoichiometric with ceramic targets, the unipolar pulses contribute – by means of extremely low arc energy – to the avoidance of increasing passivation of the chamber wall, resp. the anode and, therefore, to the stabilization of the coating process.
The combination of DC and Unipolar pulse generators is used, e.g., for the production of OLEDs, or LCD for large flat screens or for special decorative and hard coatings.